Wayne State College of Engineering hosts the American Vacuum Society Spring Symposium

On Tuesday, May 12, the Wayne State University College of Engineering hosted the American Vacuum Society (AVS) Spring Symposium, a one-day conference dedicated to providing an overview of innovative scientific and technological developments in thin films and nanostructures. Academic and industry leaders from across Southeast Michigan and Ohio gathered at the symposium - which focused on graphene nanomaterial and neural implants - to learn about the latest innovations in thin films and nanostructures.

Wayne State was an appropriate host for the symposium due to its various nanoscience and nanotechnology initiatives, such as the recent Nano Incubator Program, which utilizes our state-of-the-art research facilities with the aim to synthesize, assemble and engineer adaptive nanomaterials for imaging, sensing and drug delivery.

"AVS provided an opportunity for experts in Southeastern Michigan to get together and exchange ideas," says Mark Ming-Cheng Cheng, assistant professor of electrical and computer engineering and chair of the symposium, says of the symposium. "We were fortunate to invite eight experts in graphene and neural interfaces to come to Wayne State University and to discuss their research."

In addition to Cheng, the conference was also organized by Amar Basu, assistant professor of electrical and computer engineering at Wayne State; Yong Xu, associate professor of electrical and computer engineering at Wayne State; PC Ku, assistant professor of electrical engineering and computer science at the University of Michigan; Pilar Herrera-Fierro, lead research engineer at the University of Michigan; Ohtani Hiroko, physical chemist at Ford Motor Company; and Michael Lukitsch, senior researcher at General Motors.

The symposium attracted approximately 100 participants from Southeast Michigan, including Wayne State University, University of Toledo, Oakland University, Michigan State University and University of Michigan. There were 8 commercial companies to exhibit their latest products in vacuum and material characterization, including Agilent, Olympus, MKS, Kurt Lesker, Swagelok, STAVAC, Pfeiffer Vacuum and Great Lakes Technology.

The schedule for the symposium, along with links to presentation abstracts, can be found here.

← Back to listing